This page presents a published large-area result from the PKC1200Q. The measurement interface shows a 482 × 482 mm data region with 34.085 nm PV and 4.048 nm RMS. The same technical record also shows in-machine non-contact measurement used to identify workpiece tilt and posture, with the measured information applied to coordinate or path compensation. The result is specifically for the published 482 × 482 mm data region and must not be represented as stable 4.048 nm RMS performance over a full 1200 mm aperture.
Item | Published Record |
Customer Requirement | Demonstrate deterministic correction and posture-aware setup over the published large square data region. |
Workpiece | Published data region: 482 × 482 mm. Total workpiece size and nominal surface are not disclosed. |
Published data region | 482 × 482 mm |
Figure PV | 34.085 nm |
Figure RMS | 4.048 nm |
Posture handling | In-machine measurement + coordinate/path compensation |
Nominal XY envelope | 1200 × 1200 mm |
Processing platform | PKC1200Q |
Measurement | Published interface: Size X = 482.0 mm, Size Y = 482.0 mm, PV = 34.085 nm, RMS = 4.048 nm. Material, total size, instrument, wavelength, fit, removed terms, filtering, support state and uncertainty were not disclosed. |
Final Result | Publish 34.085 nm PV and 4.048 nm RMS only for the 482 × 482 mm data region. Do not describe it as full 1,200 mm aperture performance. |
Deterministic processing of large optical components depends on more than the removal function. Workpiece support, gravitational deformation, thermal stability, clamping repeatability, posture identification, and large-aperture metrology all influence the result. If the installed workpiece is tilted or offset, a mismatch between the real workpiece coordinate system and the programmed machining coordinates can affect path mapping and interference checks.
• Large-area figure control: A 482 × 482 mm data region requires stable removal, motion, and metrology mapping over an extended travel range.
• Posture and coordinate consistency: Large or aspheric components may exhibit centering and tilt offsets after installation, requiring measurement and transformation into coordinate or path compensation.
• Support, thermal, and gravity effects: The support state, gravity direction, soak time, and temperature uniformity can change both measured and processed figure.
The PKC1200Q uses a gantry architecture with standard X/Y/Z/A/B axes for 1200 mm-class optical components; a C axis is available as a project option. In-machine non-contact measurement supports centering, tilt and posture identification, program verification, and error analysis. The measured posture can be used to establish the relationship between workpiece and machining coordinates and to reduce conventional manual leveling through coordinate or path compensation. Figure correction remains based on the deterministic sequence of metrology, data processing, removal-function calibration, dwell-time solution, polishing, and remeasurement.
1. Support and fixture planning: Define support points, clamping method, gravity state, thermal soak, and safety limits.
2. In-machine centering and posture measurement: Measure the workpiece datum, center, and tilt to establish the real workpiece coordinate system.
3. Figure-data processing: Fix the data region, aperture mask, fit reference, removed terms, and large-aperture stitching rules.
4. Removal function and dwell time: Calibrate removal for the material, wheel, fluid, and target error, then solve the dwell-time map.
5. Posture-compensated path execution: Apply coordinate or path compensation, complete interference checks, and execute polishing.
6. Remeasurement and result verification: The published 482 × 482 mm data region shows 34.085 nm PV and 4.048 nm RMS.
The measurement interface reports Size X = 482.0 mm, Size Y = 482.0 mm, PV = 34.085 nm, and RMS = 4.048 nm. For reference, λ/150 at 632.8 nm is approximately 4.2 nm; this page nevertheless uses the directly reported nanometer value. Together with the posture-compensation scene, the result demonstrates how a large-aperture platform can organize posture identification, coordinate or path compensation, deterministic polishing, and remeasurement within one process plan.
Published data region: 34.085 nm PV and 4.048 nm RMS; in-machine measurement supports posture compensation.
In-machine non-contact measurement supports posture identification, program verification, and error analysis.
• A representative nanometer-scale RMS result over a published 482 × 482 mm data region.
• In-machine centering, tilt measurement, and posture identification for large workpieces.
• Use of measured posture in coordinate or path compensation.
• Project-oriented process planning for large flats, spheres, aspheres, and freeforms.
• Large mirrors and optical windows
• Aerospace and astronomical optics
• Large laser and infrared optical components
• Aspheric or freeform optics requiring posture measurement and compensation
Data and Metrology Note: The published record does not disclose the workpiece material, effective aperture, metrology instrument, wavelength, fit reference, removed terms, spatial filtering, polishing head, MRF fluid, or measurement uncertainty. The approximately 20-hour value is reported as the polishing time for three MRF cycles and should not automatically be interpreted as including all fixturing, metrology, cleaning, and project turnaround activities.
Case boundary Final performance is application-specific and depends on workpiece material, geometry, initial condition, fixturing, process parameters, environmental control and metrology. Numerical results apply only to this cited record and its disclosed conditions.
